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    Surface Chemistry of Electronic Materials

    This grant studies how to chemically modify and analyze diamond and other wide bandgap material surfaces in ultrahigh vacuum for electronic device applications.

    This grant is no longer accepting proposals

    NRC Research Associateship Programs has archived this opportunity.

    Funder: NRC Research Associateship Programs

    Due Dates: May 1, 2025 (Application Deadline)

    Funding Amounts: $99,200 stipend plus $3,000 travel allowance; typical postdoctoral fellowship duration 2-3 years

    Summary: Postdoctoral fellowship supporting research on surface chemistry and post-growth modification of diamond and other wide bandgap materials for electronic device applications at the Naval Research Laboratory.

    Key Information: Open to U.S. citizens and permanent residents; requires Ph.D. earned within 5 years; extensive ultrahigh vacuum surface science facilities available.


    Description

    This postdoctoral research opportunity focuses on the surface chemistry of diamonds and other wide bandgap materials such as silicon carbide (SiC), aluminum nitride (AlN), boron nitride (BN), and gallium nitride (GaN). The research aims to chemically modify and analyze these material surfaces under ultrahigh vacuum (UHV) conditions to advance electronic device applications.

    Key research interests include:

    • Chemical modification of low-index surfaces in UHV to determine their structure and chemistry.
    • Investigating how surface chemisorption and processing affect electronic properties like electron affinity and electrical conductivity, relevant for vacuum microelectronics.
    • Understanding the role of surface structure and chemistry in the nucleation and growth of doped epitaxial films.
    • Studying surface reaction mechanisms and kinetics of novel precursors used in chemical vapor deposition and doping processes.

    The Naval Research Laboratory provides extensive surface science facilities, including three UHV systems equipped with advanced surface analysis tools such as:

    • Load-locked UHV analysis and chemical vapor deposition processing with gas dosing and temperature control.
    • In situ techniques including high-resolution electron energy loss spectroscopy, Auger electron spectroscopy, ultraviolet and x-ray photoelectron spectroscopies, low-energy electron diffraction, Kelvin probe work function measurements, collinear four-point probe, infrared reflection absorption spectroscopy, attenuated total internal reflection, and multi-mass temperature programmed desorption.

    This fellowship offers a unique opportunity to conduct cutting-edge surface chemistry research with access to state-of-the-art instrumentation and expert mentorship.

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