Nanoimprint Lithography Patterning of Functional Materials
Nanoimprint lithography can alter functional material properties due to harsh processing conditions, requiring new measurements to characterize these changes.
This grant is no longer accepting proposals
NRC Research Associateship Programs has archived this opportunity.
Funder: NRC Research Associateship Programs
Due Dates: February 1, 2025 | May 1, 2025 | August 1, 2025 | November 1, 2025
Funding Amounts: Stipend approximately $82,764 per year plus $3,000 travel allowance; typical appointment duration 2 years.
Summary: Postdoctoral fellowship opportunity at NIST to study how nanoimprint lithography affects the properties of functional materials through new measurement techniques.
Key Information: Open to U.S. citizens with a doctoral degree earned within the last 5 years; requires contacting a research adviser prior to application.
Description
This fellowship supports research at the National Institute of Standards and Technology (NIST) in Gaithersburg, MD, focusing on nanoimprint lithography (NIL) patterning of functional materials. NIL is a stamping technique that can directly pattern functional materials by pressing them into nanoscale mold cavities. However, the process often involves harsh conditions such as large shear forces and extensive interface creation, which can alter the material's desired properties. Examples include changes in pore structure of nanoporous materials or crystal orientation in organic semiconductors affecting electrical characteristics.
The program seeks postdoctoral researchers to develop and apply new measurement methods to characterize these changes in functional materials after NIL processing. Research topics may include anisotropy, confinement effects, nanostructures, and patterning impacts on material properties.
