Time resolved analysis of spin dynamics in antiferromagnetic films for spin to charge conversion in topological insulators
Researching ultrafast spin-to-charge conversion in antiferromagnetic/topological insulator films for low-power computing and THz communication.
This grant is no longer accepting proposals
NRC Research Associateship Programs has archived this opportunity.
Funder: NRC Research Associateship Programs
Due Dates: May 1, 2025 (NRL opportunity)
Funding Amounts: Base stipend approximately $99,200/year with $3,000 travel allowance; duration typically 2-3 years.
Summary: Postdoctoral fellowship to research ultrafast spin-to-charge conversion in antiferromagnetic and topological insulator films at the Naval Research Laboratory for advancing low-power computing and THz communication technologies.
Key Information: Open to U.S. citizens and permanent residents holding a recent Ph.D.; includes relocation and health insurance benefits; requires contacting the research adviser prior to applying.
Description
This postdoctoral research opportunity at the Naval Research Laboratory (NRL) focuses on understanding and implementing terahertz (THz) timescale switching speeds of antiferromagnetic materials to achieve ultra-fast spin-to-charge conversion in devices enabled by topological insulators. The fellow will investigate spin dynamics in various antiferromagnetic and topological insulator materials and heterostructures, contributing to a large multidisciplinary NRL program involving fabrication, characterization, and theoretical modeling.
Research aims include maximizing efficiency for next-generation low-power computing, information processing, on-chip THz communication, and in-logic memory technologies. The fellow may also conduct polarized neutron reflectometry experiments at national laboratories or neutron sources to probe magnetization at embedded interfaces.
Key research topics include antiferromagnetic spintronics, topological insulators, spin dynamics, thin film material characterization, spin torque, and thin film surface science.
