Traceable atomic force microscope dimensional metrology
Atomic force microscopy research for semiconductor/photonics manufacturing, focusing on tip characterization, error correction, and standards development.
This grant is no longer accepting proposals
NRC Research Associateship Programs has archived this opportunity.
Funder: NRC Research Associateship Programs
Due Dates: February 1, 2025 (NIST review) | May 1, 2025 (Application deadline) | August 1, 2025 (NIST review)
Funding Amounts: $82,764 stipend plus $3,000 travel allowance; typical appointment duration 2 years.
Summary: Postdoctoral research fellowship in traceable dimensional metrology using atomic force microscopy (AFM) focused on semiconductor and photonics manufacturing.
Key Information: Open to U.S. citizens with a doctoral degree; requires contacting a NIST Research Adviser prior to application; research conducted on-site at NIST in Gaithersburg, MD.
Description
This fellowship opportunity supports postdoctoral research in traceable dimensional metrology using atomic force microscopy (AFM), with a primary focus on critical dimension AFM (CD-AFM). The research is highly relevant to semiconductor and photonics manufacturing industries. Key research areas include:
- Development of advanced tip characterization methods and standards.
- Refinement of uncertainty budgets through error correction techniques such as field mapping.
- Systematic studies of interactions between error sources and environmental parameters.
- Potential development of methods to augment CD-AFM with additional contrast modes.
- Exploration of CD-AFM applications in non-atmospheric environments.
Fellows may also collaborate on projects to develop NIST standards related to particle size metrology, scale calibration, and scanner field evaluation.
The research is conducted at the Physical Measurement Laboratory, Microsystems and Nanotechnology Division at NIST, located in Gaithersburg, MD.
